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tig welding accessories 1.5% lanthanated tungsten electrodes wl1

Negotiable
WL15 1. 6/ 2. 4/ 3. 2*150/ 175mm
1.Lathanated Tungsten are excellent for&
post: Maikewelding123
tig welding accessories 2% thoriated tungsten electrodes wt20

Negotiable
WT20 1. 6/ 2. 4/ 3. 2*150/ 175mm
Characteristic: Good cutting ability Good creep resistanc
post: Maikewelding123
silicon(si) sputtering target

5N, 6N
Silicon aluminum rotating target Silica-aluminum ratio: 90:
post: sputtertarge
molybdenum(mo) sputtering target

3N5
Element Symbol: Mo Purity: 3N5 Availble Shape: Planar targ
post: sputtertarge
silicon metal

97\553\441\3303
97\553\441\3303
post: wsh66
casfire composition analysis\graphene

CASfire Composition Analysis
Using mass spectrometry, spectroscopy, chromatography, therm
post: Helen140811
casfire metal material composition analysis

CASfire Metal Material Composition Analysis
Using mass spectrometry, spectroscopy, chromatography, therm
post: Helen140811
planar retancular silicon si target

L1900*W350*T30mm, Multi-assembly bonding into Cu plate tube Custo
Application: Widely used in various types of Optical glass,
post: sandyuvtm
planar retancular chromium cr target

L1900*W350*T30mm, Multi-assembly bonding into Cu plate tube Custo
Application: Widely used in various types of Decorative film
post: sandyuvtm
rotatable cylindrical ito sputtering target

Maximum Machining Size L 4000MM T 6-13MM
Application: Widely used in TN, STN LCD and touch screen, se
post: sandyuvtm
rotatable cylindrical aluminium al sputtering target

Maximum Machining Size L 4000MM T 6-13MM
Application: Widely used in decorative & functional coating,
post: sandyuvtm
rotatable cylindrical tial sputtering target

Maximum Machining Size L 4000MM T 6-13MM
Application: Mainly used for producing ceramic TiAl alloy f
post: sandyuvtm
rotatable cylindrical copper cu sputtering target

Maximum Machining Size L 4000MM T 6-13MM
Application: Mainly used for producing pure Cu film, widely
post: sandyuvtm
rotatable cylindrical niobium nb sputtering target

Maximum Machining Size L 4000MM T 6-13MM
Application: Widely used in optical glass, AR film of touch
post: sandyuvtm
rotatable cylindrical sial sputtering target

Maximum Machining Size L 4000MM T 6-13MM
Application: Mainly used for producing SiO2/Si3N4 film, Wide
post: sandyuvtm
rotatable cylindrical tio2 sputtering target

Maximum Machining Size L 4000MM T 6-13MM
Application: Mainly used for producing TiO2 film, widely use
post: sandyuvtm
rotatable cylindrical azo sputtering target

Maximum Machining Size L 4000MM T 6-13MM
Application: Widely used in Thin film solar cell electrode f
post: sandyuvtm
rotatable cylindrical zirconium zr sputtering target

Maximum Machining Size L 4000MM T 6-13MM
Application: Widely used in Consumer Electronics, Low-e glas
post: sandyuvtm
rotatable cylindrical silver ag sputtering target

Maximum Machining Size L 4000MM T 6-13MM
Application: Widely used in Low-E glass film, thin-film phot
post: sandyuvtm
abrasives /sa3 standard/steel grit g50 with sae and iso

400-600
G50
Steel shot Applications 1.Blast cleaning, sandblasting 2
post: abrasiveagne
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